Paper Title
Semiconductor Wafer Defects Detection using Yolov5 Model
Article Identifiers
Authors
NAGI SIVA KUMAR , RAJAN KUMAR MAHATO , Dr. S. Jana
Keywords
YOLO, RECALL, PRECESION, CNN
Abstract
Wafer defect detection is an important step in the semiconductor manufacturing process because it ensures the final product’s quality and reliability. Traditional wafer defect detection methods can be slow and error-prone, and they may be incapable of detecting small or complex defects. Machine learning algorithms such as convolutional neural networks (CNNs) have been used to detect wafer defects with promising results in recent years. YOLO (You Only Look Once), a popular object detection algorithm based on CNNs, is one such algorithm. YOLO has gone through several iterations, including YOLOv1, YOLOv2, YOLOv3, YOLOv4 and, YOLOv5 are most recent one. The YOLOv5 algorithm is the most recent version and powerful, and it includes several improvements over previous versions, such as a new object detector and a more efficient network architecture. In this research, we use YOLO v5 to detect wafer defects and evaluate its performance on a wafer image dataset. In this paper, we compare the accuracy of different YOLOv5 models. Our results show that YOLOv5x can detect wafer defects with high accuracy and speed, outperforming traditional wafer defect detection methods.
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How To Cite (APA)
NAGI SIVA KUMAR, RAJAN KUMAR MAHATO, & Dr. S. Jana (October-2023). Semiconductor Wafer Defects Detection using Yolov5 Model. INTERNATIONAL JOURNAL OF NOVEL RESEARCH AND DEVELOPMENT, 8(10), b601-b606. https://ijnrd.org/papers/IJNRD2310164.pdf
Issue
Volume 8 Issue 10, October-2023
Pages : b601-b606
Other Publication Details
Paper Reg. ID: IJNRD_193926
Published Paper Id: IJNRD2310164
Downloads: 000121994
Research Area: Electronics & Communication Engg.Â
Country: Chennai, Tamil Nadu, India
Published Paper PDF: https://ijnrd.org/papers/IJNRD2310164.pdf
Published Paper URL: https://ijnrd.org/viewpaperforall?paper=IJNRD2310164
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Journal Name: INTERNATIONAL JOURNAL OF NOVEL RESEARCH AND DEVELOPMENT(IJNRD)
ISSN: 2456-4184 | IMPACT FACTOR: 8.76 Calculated By Google Scholar | ESTD YEAR: 2016
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This work is licensed under a Creative Commons Attribution 4.0 International License and The Open Definition


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